Title of article
The electrical field effect on the growth of titanium oxide layers by ML-ALE
Author/Authors
V.E. Drozd، نويسنده , , N.N Kopilov، نويسنده , , V.B Aleskovski، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
6
From page
258
To page
263
Abstract
Study of the electric field effect on the titanium oxide growth by molecular layering (ML)-atomic layer epitaxy (ALE) method was produced in the present work. It was found that electric field effect on the adsorption process of the precursors during ML-ALE cycles under both polarities of a field. The field affect depended on a stage of a cycle ML-ALE (half-reaction of ML-ALE). The strength of a field strongly influenced on the thickness of titanium oxide layers in the beginning of a growth process until the layer thickness reached 5.0–6.0 nm. It was found that field influence did not depend on a sublayer composition. The electric field affect at different temperatures and voltages was studied. It was found that electric field effected a structure of the synthesized layers. At room temperature we synthesized a rutile structure — the more thermodynamically stable modification of titanium oxide. The explanation of these results was made on the basis of an electronic adsorption theory.
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991532
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