Title of article
Preparation of manganese silicide thin films by solid phase reaction
Author/Authors
Jinliang Wang، نويسنده , , Masaaki Hirai، نويسنده , , Masahiko Kusaka، نويسنده , , Motohiro Iwami، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
4
From page
53
To page
56
Abstract
A thin film formation of MnSi and MnSi1.7 on a silicon substrate through solid phase reaction has been studied, where MnSi1.7 is one of the few semiconducting silicides, while MnSi is a metallic one. The growth process and electronic states of manganese silicides with composition of MnSi and MnSi1.7 are investigated by several methods, including soft X-ray emission spectroscopy.
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991544
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