Title of article :
Porous silicon annealed under mixed hydrogen and argon atmosphere
Author/Authors :
Takato Nakamura، نويسنده , , Hideki Omoya، نويسنده , , Kazuya Sasaki، نويسنده , , Naoto Azuma، نويسنده , , Hidenori Mimura، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
4
From page :
145
To page :
148
Abstract :
Light emitting properties of porous silicon annealed under mixed H2 and Ar gas flowing at various temperatures has been examined. Photoluminescence of the porous silicon annealed at 950°C gives a peak at 470 nm with the full-width-at-half-maximum of 50 nm.
Journal title :
Applied Surface Science
Serial Year :
1997
Journal title :
Applied Surface Science
Record number :
991561
Link To Document :
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