Title of article :
X-ray diffraction patterns of C60 films by the thin film method and the intercalation of O2
Author/Authors :
Takashi Itoh، نويسنده , , Shoji Nitta، نويسنده , , Shuichi Nonomura، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
4
From page :
282
To page :
285
Abstract :
The intercalation and the evolution of O2 in C60 films and the relation to the crystallinity are studied by the X-ray diffraction and gas effusion spectra. It is confirmed by the results of the X-ray diffraction that C60 films prepared on Corning 7059 glass, c-Si, sapphire and mica are crystallized. The X-ray diffraction patterns of C60 films obtained by the thin film method are clearer than those obtained by the conventional θ-2θ method. Two evolution peaks of O2 are found around 80°C and 170°C in gas effusion spectra for C60 films on Corning 7059 glass substrates exposed to air for about 5 days at room temperature. The intercalation and the evolution of O2 in C60 films and the relation to the crystallinity are discussed.
Journal title :
Applied Surface Science
Serial Year :
1997
Journal title :
Applied Surface Science
Record number :
991592
Link To Document :
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