Title of article :
Influence of film thickness on the molecular arrangement of copper phthalocyanine on hydrogen-terminated Si(111)
Author/Authors :
Masakazu Nakamura، نويسنده , , Yukinori Morita، نويسنده , , Hiroshi Tokumoto، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
6
From page :
316
To page :
321
Abstract :
The growth nature of copper phthalocyanine thin-film from a monolayer to 20 nm thickness on hydrogen-terminated flat Si(111) was studied with MBE-STM and other complementary techniques. The molecules were found to adsorb randomly at 60°C for surface coverages up to around one monolayer, but, form an ordered structure above a few monolayers. At higher temperature (≥ 140°C), crystalline nuclei were observed from the very beginning of the growth and the remaining area was not fully covered by the molecules. These results suggest that the stacking of the molecules of more than a few monolayers is necessary to form an ordered two-dimensional lattice on this surface.
Journal title :
Applied Surface Science
Serial Year :
1997
Journal title :
Applied Surface Science
Record number :
991598
Link To Document :
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