• Title of article

    Investigation of the Sn/GaP(110) interface by core level photoemission: interface reaction, growth morphology and surface photovoltage effects

  • Author/Authors

    T Chassé، نويسنده , , a، نويسنده , , G Neuholda، نويسنده , , J.J Paggelb، نويسنده , , K Hornb، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1997
  • Pages
    10
  • From page
    326
  • To page
    335
  • Abstract
    Interface reaction, morphology and electronic properties of the Sn/GaP(110) interface have been studied using photoelectron spectroscopy, LEED and SEM. A weak reaction has been observed by photoemission, which was confined to just the interface bonds. The growth of the tin film proceeds by the Stranski-Krastanov mode. On an about two monolayer thick, ordered layer of tin 3D islands grow, which exhibit metallic properties. Surface photovoltage effects including significant flux dependence have been observed up to such high nominal coverages as 100 nm. They have been used to predict the semiconducting nature of the initial tin wetting layer.
  • Keywords
    Growth mode , Gallium phosphide , TIN , Surface photovoltage , Metal/semiconductor interfaces , Schottky barrier
  • Journal title
    Applied Surface Science
  • Serial Year
    1997
  • Journal title
    Applied Surface Science
  • Record number

    991678