• Title of article

    Effects of electric field on silicide formation

  • Author/Authors

    Hiroko Murakami * ، نويسنده , , Kazunori Ono، نويسنده , , Hiroshi Takai، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1997
  • Pages
    5
  • From page
    289
  • To page
    293
  • Abstract
    Effects of an external electric field during annealing on the Ni- and Nb-silicide formation were investigated. Formation of Nb- and Ni- silicides can be accelerated or retarded in the presence of an external electric field during the annealing. It was found that enhancement of silicidation depends not on the polarity of the applied voltage, but on 1 VI. The activation energies ,?Z, of Nb-silicides are found not be affected by the applied voltage, but the pre-exponential factors La of the linear reaction rate constant are found to be 1.1 X IO6 and 6.3 X 10’ cm/s for 0 and f 1 kV, respectively.
  • Keywords
    Nb-silicide , Ni-silicide , Electric field , growth kinetics , Electrostatic force
  • Journal title
    Applied Surface Science
  • Serial Year
    1997
  • Journal title
    Applied Surface Science
  • Record number

    991802