Title of article
Effects of electric field on silicide formation
Author/Authors
Hiroko Murakami * ، نويسنده , , Kazunori Ono، نويسنده , , Hiroshi Takai، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
5
From page
289
To page
293
Abstract
Effects of an external electric field during annealing on the Ni- and Nb-silicide formation were investigated. Formation of
Nb- and Ni- silicides can be accelerated or retarded in the presence of an external electric field during the annealing. It was
found that enhancement of silicidation depends not on the polarity of the applied voltage, but on 1 VI. The activation energies
,?Z, of Nb-silicides are found not be affected by the applied voltage, but the pre-exponential factors La of the linear reaction
rate constant are found to be 1.1 X IO6 and 6.3 X 10’ cm/s for 0 and f 1 kV, respectively.
Keywords
Nb-silicide , Ni-silicide , Electric field , growth kinetics , Electrostatic force
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991802
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