Title of article :
Effects of electric field on silicide formation
Author/Authors :
Hiroko Murakami * ، نويسنده , , Kazunori Ono، نويسنده , , Hiroshi Takai، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
5
From page :
289
To page :
293
Abstract :
Effects of an external electric field during annealing on the Ni- and Nb-silicide formation were investigated. Formation of Nb- and Ni- silicides can be accelerated or retarded in the presence of an external electric field during the annealing. It was found that enhancement of silicidation depends not on the polarity of the applied voltage, but on 1 VI. The activation energies ,?Z, of Nb-silicides are found not be affected by the applied voltage, but the pre-exponential factors La of the linear reaction rate constant are found to be 1.1 X IO6 and 6.3 X 10’ cm/s for 0 and f 1 kV, respectively.
Keywords :
Nb-silicide , Ni-silicide , Electric field , growth kinetics , Electrostatic force
Journal title :
Applied Surface Science
Serial Year :
1997
Journal title :
Applied Surface Science
Record number :
991802
Link To Document :
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