• Title of article

    Analysis of indium surface segregation in molecular beam epitaxy of InGaAs/GaAs quantum wells

  • Author/Authors

    Koichi Yamaguchi، نويسنده , , Tetsuya Okada، نويسنده , , Fumito Hiwatashi، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1997
  • Pages
    5
  • From page
    700
  • To page
    704
  • Abstract
    Pseudomorphic InGaAs/GaAs quantum wells (QWs) were grown by molecular beam epitaxy (MBE) under various growth conditions. Surface segregation of indium atoms during MBE growth influenced the QW structures, and the evidence was measured by a secondary ion mass spectroscopy and a low temperature photoluminescence. Calculated results based on a kinetic model of the surface segregation were compared with experimental ones. It was found that the change of InGaAs/GaAs heterointerface due to the surface segregation can be almost predicted by a kinetic model, and a segregation energy could be estimated.
  • Keywords
    Molecular Beam Epitaxy , Quantum well , heterointerface , kinetic model , Surface segregation
  • Journal title
    Applied Surface Science
  • Serial Year
    1997
  • Journal title
    Applied Surface Science
  • Record number

    991873