Title of article
Analysis of indium surface segregation in molecular beam epitaxy of InGaAs/GaAs quantum wells
Author/Authors
Koichi Yamaguchi، نويسنده , , Tetsuya Okada، نويسنده , , Fumito Hiwatashi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
5
From page
700
To page
704
Abstract
Pseudomorphic InGaAs/GaAs quantum wells (QWs) were grown by molecular beam epitaxy (MBE) under various
growth conditions. Surface segregation of indium atoms during MBE growth influenced the QW structures, and the evidence
was measured by a secondary ion mass spectroscopy and a low temperature photoluminescence. Calculated results based on
a kinetic model of the surface segregation were compared with experimental ones. It was found that the change of
InGaAs/GaAs heterointerface due to the surface segregation can be almost predicted by a kinetic model, and a segregation
energy could be estimated.
Keywords
Molecular Beam Epitaxy , Quantum well , heterointerface , kinetic model , Surface segregation
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991873
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