Title of article :
Analysis of GaAs/SiN interface states and hot carrier annealing effects in GaAs MESFET
Author/Authors :
Hajime Sasaki، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
6
From page :
729
To page :
734
Abstract :
We have analyzed in detail the disappearance phenomenon of the plasma induced interface states (GaAs/SiN) on GaAs MESFET by means of drain current transient, three-terminal gate current, optical beam induced current (OBIC) and light emission. The energy level of trapped electrons in the interface states distributes widely in the band-gap below the conduction band. The interface states decrease by high temperature operation keeping its energy level constant. It requires hot-carrier effects to decrease the interface states.
Keywords :
GaAs MESFET , Hot carrier , Interface state , Drain current transient , Reliability
Journal title :
Applied Surface Science
Serial Year :
1997
Journal title :
Applied Surface Science
Record number :
991879
Link To Document :
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