Title of article
Analysis of GaAs/SiN interface states and hot carrier annealing effects in GaAs MESFET
Author/Authors
Hajime Sasaki، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
6
From page
729
To page
734
Abstract
We have analyzed in detail the disappearance phenomenon of the plasma induced interface states (GaAs/SiN) on GaAs
MESFET by means of drain current transient, three-terminal gate current, optical beam induced current (OBIC) and light
emission. The energy level of trapped electrons in the interface states distributes widely in the band-gap below the
conduction band. The interface states decrease by high temperature operation keeping its energy level constant. It requires
hot-carrier effects to decrease the interface states.
Keywords
GaAs MESFET , Hot carrier , Interface state , Drain current transient , Reliability
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991879
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