Title of article :
Evolution
Author/Authors :
Masamichi Yoshimura، نويسنده , , Kazuyuki Ueda، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Abstract :
We have examined atomistic processes of hydrogen desorption from the View the MathML source surface by scanning tunneling microscopy (STM). At a low hydrogen dose, Si atoms are etched from the surface and the patched pattern of 2 × 1 and 1 × 2, where each step edge penetrates into neighboring steps, is observed. On the other hand, a quasi-stable c(4 × 4) surface reconstruction is observed for high doses of hydrogen before the complete recovery of the 2 × 1 structure. It is found that the formation of the c(4 × 4) structure needs a rather large density of vacancies and that the domains are pinned at the clusters and disordered areas on the surface.
Keywords :
Scanning tunneling microscopy , Etching , Silicon , Hydrogen , Surface defects , Surface diffusion
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science