Title of article
Annealing effect on surfaces of 4H(6H)SiC(0001)Si face
Author/Authors
T. Tsukamoto and M. Iwaki، نويسنده , , M. Hirai، نويسنده , , M. Kusaka، نويسنده , , M. Iwami and M. Yanagihara، نويسنده , , T. Ozawa، نويسنده , , T. Nagamura، نويسنده , , T. Nakata، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
5
From page
467
To page
471
Abstract
We have investigated 4H- and 6HSiC(0001)Si faces prepared by heat treatment using Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and scanning tunneling microscopy (STM) in ultra high vacuum (UHV). The following were elucidated: 3 × 3 reconstruction was observed on the surface prepared at ∼ 1000°C, while 6 × 6 superstructure was observed for a specimen prepared at ∼ 1200°C. The 6 × 6 reconstruction can be explained as a moiré pattern produced by a graphite layer sitting on top of SiC surface. Also AES p-p height ration of Si(LVV)C(KLL) decreased at a higher temperature for 4HSiC than for 6HSiC, which could be due to the fact that the bond strength of 4HSiC is more than that of 6HSiC.
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
992127
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