Author/Authors :
Takeo Hattori، نويسنده , ,
Masaaki Fujimura، نويسنده , ,
Tomoyuki Yagi، نويسنده , ,
Masatoshi Ohashi، نويسنده ,
Abstract :
The periodic changes in surface microroughness of thermal oxide films formed on Si(100) surface with a period in thickness of 0.18 nm were discovered using a noncontact-mode atomic force microscope. This observation combined with structural studies of the interface implies that the layer-by-layer oxidation occurs locally.
