Title of article :
Formation of polycrystalline silicon with log-normal grain size distribution
Author/Authors :
Ralf B. Bergmann، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
5
From page :
376
To page :
380
Abstract :
Polycrystalline silicon films, prepared by annealing from amorphous precursors, are analyzed by transmission electron microscopy and reveal a logarithmic-normal distribution of grain sizes. Such size distributions also result from various other crystallization processes from non-crystalline phases. The cessation of nucleation due to the finite amorphous reservoir leads to these logarithmic-normal size distributions. The origin of these observed distributions is a result of nucleation and growth, rather than coarsening of crystallites.
Keywords :
81.10.Jt , 64.60.Qb , 64.70.Kb , 81.30.Hd
Journal title :
Applied Surface Science
Serial Year :
1998
Journal title :
Applied Surface Science
Record number :
992232
Link To Document :
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