Abstract :
The surface of vapor deposited parylene AF-4 wpoly a,a,aX,aX-tetrafluoro-p-xylylene.x was characterized by atomic
force microscopy AFM.and X-ray photoelectron spectroscopy XPS.. Subsequent interactions with trimethylaluminum
TMA.were studied by XPS. TMA was adsorbed onto an unmodified parylene AF-4 sample 30 L, 112 K.. The sample was
then annealed to 300, 550 and 600 K sequentially.in ultra-high vacuum. A reaction occurs between the precursor, the
polymer surface and physisorbed water at or below 300 K, producing Al–C, Al–O and Al–F bonds as evidenced by changes
in the XPS spectra. The reaction produces a thermally stable, aluminum-oxide film bound to the polymer through
aluminum–carbon bonds. A fluorine concentration gradient exists in the form of a fluorinated aluminum oxide across the
film, with increasing fluorination toward the adlayerrpolymer interface. q1998 Elsevier Science B.V.
