XPS studies of copper deposition from 1,5-cyclooctadiene-copper(I)-hexafluoroacetylacetonate on Si(111)

The deposition and dissociation of the precursor 1,5-cyclooctadiene-copper(I)-hexafluoroacetylacetonate [(COD)Cu(hfac)] on Si(111)-7×7 was studied by XPS at various temperatures. COD is desorbed by ∼233 K and the decomposition of the hfac ligand occurs by a temperature of 383 K, probably with migration of CFx groups to the Si surface. These further decompose above 383 K and all F signals are lost by 983 K. Only C and O remain detectable on the surface above 983 K, the former probably as carbide.