Title of article :
Laser ablation deposition of crystalline copper-phthalocyanine
thin films
Author/Authors :
E. Ina، نويسنده , , N. Matsumoto، نويسنده , , E. Shikada، نويسنده , , F. Kannari، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Abstract :
The poor crystallinity of copper-phthalocyanine CuPc.thin films fabricated via KrF laser ablation is significantly
improved by three different assisting methods applied during deposition: 1. elevating substrate temperature only up to 508C;
2. irradiating with HeNe laser of ;200 mWrcm2; 3. applying DC electric field. Highest crystallinity is obtained when the
film is deposited under DC electric field of ;50 Vrcm in the direction of film thickness. This in-process electric poling
also works for 4-dialkylamino-4X-nitrostilbensen DANS.film. q1998 Elsevier Science B.V.
Keywords :
Organic thin films , Copper-phthalocyanine , Laser ablation deposition , Electric poling
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science