Title of article
Vacuum-ultraviolet laser-induced refractive index change of fused silica
Author/Authors
Koji Sugioka، نويسنده , , Jie Zhang، نويسنده , , Schlomo Ruschin، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
5
From page
843
To page
847
Abstract
Increases as large as 0.036–0.038 in the refractive index of fused silica induced by multi-wavelength irradiation of
substrates by vacuum-ultraviolet VUV.light emitted from a VUV Raman laser are reported. The index change is ascribed
to photoinduced decomposition of Si–O bonds in fused silica by the VUV beam irradiation. The modified areas are
practically invisible in optical microscope and atomic force microscope observations. The modified depth is estimated to be
about 0.53–0.62 mm. Efficient phase gratings are created by illuminating the substrates through periodically patterned
contact masks. q1998 Elsevier Science B.V.
Keywords
fused silica , Laser modification , Vacuum-ultraviolet VUV.laser , refractive index
Journal title
Applied Surface Science
Serial Year
1998
Journal title
Applied Surface Science
Record number
992533
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