Title of article :
Vacuum-ultraviolet laser-induced refractive index change of fused silica
Author/Authors :
Koji Sugioka، نويسنده , , Jie Zhang، نويسنده , , Schlomo Ruschin، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
5
From page :
843
To page :
847
Abstract :
Increases as large as 0.036–0.038 in the refractive index of fused silica induced by multi-wavelength irradiation of substrates by vacuum-ultraviolet VUV.light emitted from a VUV Raman laser are reported. The index change is ascribed to photoinduced decomposition of Si–O bonds in fused silica by the VUV beam irradiation. The modified areas are practically invisible in optical microscope and atomic force microscope observations. The modified depth is estimated to be about 0.53–0.62 mm. Efficient phase gratings are created by illuminating the substrates through periodically patterned contact masks. q1998 Elsevier Science B.V.
Keywords :
fused silica , Laser modification , Vacuum-ultraviolet VUV.laser , refractive index
Journal title :
Applied Surface Science
Serial Year :
1998
Journal title :
Applied Surface Science
Record number :
992533
Link To Document :
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