Title of article
Scanning tunneling microscopy study of the initial reaction of SiH2Cl2 molecules with the Si(111)-7×7 surface
Author/Authors
Takuji Komura، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
6
From page
23
To page
28
Abstract
The initial stage of the reaction of dichlorosilane (SiH2Cl2) with the Si(111)-(7×7) surface under exposure below 1 L is investigated using a scanning tunneling microscope (STM). We found that corner adatoms are preferentially reacted over the center adatoms at the very beginning of exposure. The initial reaction process of SiH2Cl2 with Si(111)-(7×7) surface is discussed. It is suggested that the preferential reactivity of a corner-hole atom is reduced as the exposure increases, which may give rise to reacted rest atoms.
Journal title
Applied Surface Science
Serial Year
1998
Journal title
Applied Surface Science
Record number
992572
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