Title of article
Initial oxidation stage of the Ge 100/2=1 surface studied by scanning tunneling microscopy and ultra-violet photoelectron spectroscopy
Author/Authors
T. Fukuda )، نويسنده , , T. Ogino، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
5
From page
165
To page
169
Abstract
The initial stage of oxygen chemisorption on the Ge 100.surface and its annealing behavior were studied by scanning
tunneling microscopy STM.and ultra-violet photoelectron spectroscopy UPS.. Atomically resolved dark and bright sites
were identified by the interaction at room-temperature exposure to molecular oxygen. These surfaces showed a prominent
peak at 4.6 eV in the UPS spectra. After annealing at 3008C, the oxygen-induced products clustered along the dimer rows
and formed an aligned dark structure. Isolated bright products still remained, and some of them were the same as those on
the room-temperature exposure. UPS spectra showed a shift on the peak energy to 5.5 eV, indicating that a stable Ge–O–Ge
complex has been formed by the annealing. q1998 Elsevier Science B.V. All rights reserved.
Keywords
STM , Oxidation , Atomic structure , Ge 100.
Journal title
Applied Surface Science
Serial Year
1998
Journal title
Applied Surface Science
Record number
992595
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