Title of article :
Initial oxidation stage of the Ge 100/2=1 surface studied by
scanning tunneling microscopy and ultra-violet photoelectron
spectroscopy
Author/Authors :
T. Fukuda )، نويسنده , , T. Ogino، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Abstract :
The initial stage of oxygen chemisorption on the Ge 100.surface and its annealing behavior were studied by scanning
tunneling microscopy STM.and ultra-violet photoelectron spectroscopy UPS.. Atomically resolved dark and bright sites
were identified by the interaction at room-temperature exposure to molecular oxygen. These surfaces showed a prominent
peak at 4.6 eV in the UPS spectra. After annealing at 3008C, the oxygen-induced products clustered along the dimer rows
and formed an aligned dark structure. Isolated bright products still remained, and some of them were the same as those on
the room-temperature exposure. UPS spectra showed a shift on the peak energy to 5.5 eV, indicating that a stable Ge–O–Ge
complex has been formed by the annealing. q1998 Elsevier Science B.V. All rights reserved.
Keywords :
STM , Oxidation , Atomic structure , Ge 100.
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science