Title of article :
Reactivity of O with Si 111/surfaces with different surface 2 structures
Author/Authors :
K. Shimada، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
6
From page :
170
To page :
175
Abstract :
Reactivity of O2 with Si 111. surfaces in which both 7=7 dimer–adatom-stacking fault DAS. domains and unreconstructed ‘1=1’ region coexist, have been investigated. The change in surface morphology due to O2 exposure has been monitored in-situ with high temperature STM. The acquired sequential images clearly show that the change due to oxidation preferentially takes place at such sites as ‘1=1’ region, 7=7–‘1=1’ phase boundary and the missing adatom sites in a 7=7 domain, where adatoms have a space to displace upon oxidation. q1998 Elsevier Science B.V. All rights reserved.
Keywords :
High temperature STM , Preferential reaction , Si 111. , Dimer–adatom-stacking fault , Oxygen , Structure dependence
Journal title :
Applied Surface Science
Serial Year :
1998
Journal title :
Applied Surface Science
Record number :
992596
Link To Document :
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