• Title of article

    Higher-order desorption kinetics of hydrogen from silaner, disilaner, and DrSi 100/

  • Author/Authors

    Hideki Nakazawa، نويسنده , , Maki Suemitsu، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1998
  • Pages
    6
  • From page
    298
  • To page
    303
  • Abstract
    Hydrogen desorption kinetics from silaner, disilaner, and DrSi 100.-2=1 surfaces with and without thermal processings have been investigated using temperature-programmed desorption TPD.measurements. In contrast to previ- ously reported first-order desorption kinetics from HrSi 100. surface, the kinetics became higher-order under certain conditions of hydrogenating gases and thermal processings. Specifically, the hydrogen desorption from a post-annealed, silane-saturated surface showed the highest reaction order of all the combinations. A unified explanation is given to these results using the prepairing of surface hydrogen atoms at a dimer. q1998 Elsevier Science B.V. All rights reserved
  • Keywords
    Hydrogen desorption kinetics , Si 100. , Temperature-programmed desorption , Doubly-occupied dimer , Silane , Disilane
  • Journal title
    Applied Surface Science
  • Serial Year
    1998
  • Journal title
    Applied Surface Science
  • Record number

    992618