Title of article
Higher-order desorption kinetics of hydrogen from silaner, disilaner, and DrSi 100/
Author/Authors
Hideki Nakazawa، نويسنده , , Maki Suemitsu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
6
From page
298
To page
303
Abstract
Hydrogen desorption kinetics from silaner, disilaner, and DrSi 100.-2=1 surfaces with and without thermal
processings have been investigated using temperature-programmed desorption TPD.measurements. In contrast to previ-
ously reported first-order desorption kinetics from HrSi 100. surface, the kinetics became higher-order under certain
conditions of hydrogenating gases and thermal processings. Specifically, the hydrogen desorption from a post-annealed,
silane-saturated surface showed the highest reaction order of all the combinations. A unified explanation is given to these
results using the prepairing of surface hydrogen atoms at a dimer. q1998 Elsevier Science B.V. All rights reserved
Keywords
Hydrogen desorption kinetics , Si 100. , Temperature-programmed desorption , Doubly-occupied dimer , Silane , Disilane
Journal title
Applied Surface Science
Serial Year
1998
Journal title
Applied Surface Science
Record number
992618
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