Title of article :
Thermal diffusion of Er atoms d-doped in InP
Author/Authors :
M. Tabuchi، نويسنده , , K. Fujita، نويسنده , , Kenji J. Tsuchiya، نويسنده , , Y. Fujiwara، نويسنده , , Y. Takeda، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
5
From page :
393
To page :
397
Abstract :
Er s-doped InP samples were investigated by X-ray CTR crystal truncation rod.scattering measurement. The samples were prepared by OMVPE growth at 5308C, and after the growth annealed at 580, 630, and 6508C for 10–240 m. The distribution of Er atoms in InP was analyzed from the measured X-ray CTR spectra, and the diffusion coefficients of Er atoms in InP at 580, 630, and 6508C were obtained to be 1.2, 2.1 and 3.1=10y18 cm2 sy1. Such small diffusion coefficients suggest that Er atoms in InP are substitutional type impurity or form stable micro-crystals in InP. q1998 Elsevier Science B.V. All rights reserved
Keywords :
X-ray CTR , Er d-doping , Er diffusion coefficient
Journal title :
Applied Surface Science
Serial Year :
1998
Journal title :
Applied Surface Science
Record number :
992633
Link To Document :
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