• Title of article

    Thermal diffusion of Er atoms d-doped in InP

  • Author/Authors

    M. Tabuchi، نويسنده , , K. Fujita، نويسنده , , Kenji J. Tsuchiya، نويسنده , , Y. Fujiwara، نويسنده , , Y. Takeda، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1998
  • Pages
    5
  • From page
    393
  • To page
    397
  • Abstract
    Er s-doped InP samples were investigated by X-ray CTR crystal truncation rod.scattering measurement. The samples were prepared by OMVPE growth at 5308C, and after the growth annealed at 580, 630, and 6508C for 10–240 m. The distribution of Er atoms in InP was analyzed from the measured X-ray CTR spectra, and the diffusion coefficients of Er atoms in InP at 580, 630, and 6508C were obtained to be 1.2, 2.1 and 3.1=10y18 cm2 sy1. Such small diffusion coefficients suggest that Er atoms in InP are substitutional type impurity or form stable micro-crystals in InP. q1998 Elsevier Science B.V. All rights reserved
  • Keywords
    X-ray CTR , Er d-doping , Er diffusion coefficient
  • Journal title
    Applied Surface Science
  • Serial Year
    1998
  • Journal title
    Applied Surface Science
  • Record number

    992633