The study of amorphization in multilayer FerHf with slow positron beam

The positron annihilation parameters vs. the incident positron energy are measured in the thin Hf 100 nm, 500 nm.films and the Fe 250 nm.rHf 250 nm.bilayers on quartz glass substrate, by means of the variable energetic slow-positron beam technique. We have analyzed the change in vacancy-type defects in these thin films and bilayers through annealing. q1998 Elsevier Science B.V. All rights reserved.