Title of article :
Structure characterization of vanadium oxide thin films prepared by magnetron sputtering methods
Author/Authors :
Jingzhong Cui، نويسنده , , Daoan Da، نويسنده , , Wanshun Jiang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
5
From page :
225
To page :
229
Abstract :
Vanadium oxides thin films prepared by magnetron sputtering methods have been studied with X-ray photoelectron spectroscopy, atomic force microscopy and X-ray diffraction. The phases of vanadium oxide films were related to the V2p3/2 binding energy in the XPS. The AFM images of polycrystalline vanadium dioxide surface were given. The electronic, micro and macro properties of VO2 thin film are coincident with its optical and electrical measurement.
Keywords :
Vanadium oxides , atomic force microscopy , Polycrystalline
Journal title :
Applied Surface Science
Serial Year :
1998
Journal title :
Applied Surface Science
Record number :
992752
Link To Document :
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