Title of article
Size reduction of self assembled quantum dots by annealing
Author/Authors
J. Johansson )، نويسنده , , W. Seifert، نويسنده , , V. Zwiller، نويسنده , , T. Junno، نويسنده , , L. Samuelson ، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
6
From page
47
To page
52
Abstract
Quantum dots in the materials systems InPrGaAs and InPrGa0.5In0.5P were grown at 6008C by low pressure MOVPE
in the Stranski–Krastanow growth mode and annealed under PH3rH2at growth temperature. AFM investigations of free
standing islands InPrGaAs.show a continuous decrease in height from 19 to 7 nm after 30 min annealing. Photolumines-
cence measurements on the overgrown dot samples InPrGa0.5In0.5P.show a shift of the quantum dot emission peak
towards higher energies with an increase in annealing time. The proposed explanation relies on exchange reactions between
the islands and the wetting layer, as well as alloying between the wetting layer and the underlying substrate due to
interdiffusion. q1998 Elsevier Science B.V. All rights reserved.
Keywords
Stranski–Krastanow growth , Metal organic vapor phase epitaxy , self assembling , quantum dots , annealing
Journal title
Applied Surface Science
Serial Year
1998
Journal title
Applied Surface Science
Record number
992765
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