Title of article :
Deposition of tantalum oxide films by ArF excimer laser ablation
Author/Authors :
Yukio Nishimura، نويسنده , ,
Akihiro Shinkawa، نويسنده , , Hiroki Ujita، نويسنده , , Masaharu Tsuji، نويسنده , , Masafumi Nakamura، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Abstract :
Effect of substrate temperatures has been studied for the deposition of tantalum oxide films by ArF excimer laser ablation. Orthorhombic tantalum pentaoxide film (β-Ta2O5) were formed at substrate temperatures above 650°C. Small grains of β-Ta2O5 deposited densely on the film obtained at 700°C. Surface roughness of the films increased with raising substrate temperatures.
Keywords :
?-Ta2O5 , Thin film growth , Tantalum oxides , Laser ablation , AFM
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
