Title of article
Structural characterization of TiO thin films obtained by pulsed 2 laser deposition
Author/Authors
L. Escobar-Alarco´n، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
7
From page
38
To page
44
Abstract
The structural characterization by Raman spectroscopy and X-ray diffraction of TiO2 thin films obtained by pulsed laser
deposition is reported. The substrate temperature and the oxygen pressure effects are investigated. The main result is that
rutile TiO2 thin films are obtained at low substrate temperatures. The film growth occurred mainly in the 110.direction.
q1999 Elsevier Science B.V. All rights reserved.
Keywords
Pulsed laser irradiation , Raman spectroscopy , thin films
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
992891
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