Structural characterization of TiO thin films obtained by pulsed 2 laser deposition

The structural characterization by Raman spectroscopy and X-ray diffraction of TiO2 thin films obtained by pulsed laser deposition is reported. The substrate temperature and the oxygen pressure effects are investigated. The main result is that rutile TiO2 thin films are obtained at low substrate temperatures. The film growth occurred mainly in the 110.direction. q1999 Elsevier Science B.V. All rights reserved.