Title of article :
Crystallization kinetics of thermally evaporated As Te In 45.2 46.6 8.2
thin films
Author/Authors :
A.H Moharram، نويسنده , , M.M Hafiz، نويسنده , , A.A Abu-Sehly، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Abstract :
Glassy As45.2Te46.6In8.2 thin films were thermally evaporated onto chemically cleaned glass substrates. Crystallization
kinetics were determined under isothermal conditions. Heating the film up to the isothermal temperature with different rates
was found to yield films with different electrical characterization. Conductivity of the investigated film was used as a
parameter indicating the crystallized fraction x t.. The obtained values of the activation energy for crystallization, the
frequency factor and the Avrami index are 100"0.5.kJrmol, 7.31"0.04. 108 sy1 and 1.45, respectively. The
non-integer value of the Avrami index indicates that two crystallization mechanisms are responsible for the crystal growth.
q1999 Elsevier Science B.V. All rights reserved
Keywords :
Crystallization kinetics , As45.2Te46.6 In8.2 thin films , Conductivity
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science