Title of article
Photopolymerization by evanescent waves: characterization of photopolymerizable formulation for photolithography with nanometric resolution
Author/Authors
Anne Espanet، نويسنده , , Georges Dos Santos، نويسنده , , Carole Ecoffet )، نويسنده , , Daniel J. Lougnot، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
6
From page
87
To page
92
Abstract
We have recently introduced a photolithography process using photopolymerization by evanescent waves PEW.which is
specially suitable for the fabrication of very thin films and parts of polymers from few nanometers to 1 mm.. In this work,
the response of formulations with various concentrations of amine cosynergist is examined in terms of timerintensity
reciprocity. q1999 Published by Elsevier Science B.V. All rights reserved.
Keywords
Thin films , Evanescent waves , Photopolymers , Microparts fabrication , Photolithography
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
992932
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