Modifications of polyether-etherketone surface after 193 nm and 248 nm excimer laser radiation

The modifications induced by excimer laser radiations on polyether-etherketone surfaces have been investigated depending on the laser process parameters for laser fluences below the material ablation threshold. In the case of a 193 nm laser treatment, an important increase of the adhesive properties of PEEK is obtained due to the formation of new polar and reactive groups on the surface. The content of these reactive groups has to be controlled since their presence in high concentration may also have a negative effect on the mechanical properties of the treated surface. Laser treatments using a 248 nm radiation never lead to a significant increase in the adhesive bonding properties of PEEK. This probably results from a thermal degradation of the surface at this laser wavelength. q1999 Elsevier Science B.V. All rights reserved.