Title of article :
Infrared absorption analysis of organosiliconroxygen plasmas in a microwave multipolar plasma excited by distributed electron cyclotron resonance
Author/Authors :
P. Raynaud، نويسنده , , T. Amilis، نويسنده , , Y. Segui، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
7
From page :
285
To page :
291
Abstract :
The dissociation of four groups of organosilicon monomers hexamethyldisiloxane, tetraethoxysilane, tetramethylsilane or tetramethoxysilane. in a multipolar microwave plasma reactor is analyzed by infrared absorption spectroscopy IRAS.. The parent molecules are totally dissociated above 100 W. The resulting stable molecules, such as C2H2, CH4, CO2, CO, C2H4, and OCH2 have been detected at low power but are dissociated at higher power. Each group exhibits its own characteristics of dissociation as well as production of new species depending on its chemical composition. The IR measurements confirm the extreme effectiveness of the distributed electron cyclotron resonance DECR.plasma excitation mode in molecular dissociation. It seems that the DECR plasma at high energy dissociates the monomer molecule into its constituent atoms. q1999 Elsevier Science B.V. All rights reserved.
Keywords :
thin-film deposition , PLASMA , Organosilicon , Infrared spectroscopy
Journal title :
Applied Surface Science
Serial Year :
1999
Journal title :
Applied Surface Science
Record number :
995008
Link To Document :
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