Title of article :
Infrared absorption analysis of organosiliconroxygen plasmas in a microwave multipolar plasma excited by distributed electron cyclotron resonance
Author/Authors :
P. Raynaud، نويسنده , , T. Amilis، نويسنده , , Y. Segui، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
7
From page :
285
To page :
291
Abstract :
P. Raynaud ), T. Amilis, Y. Segui
Keywords :
PLASMA , Infrared spectroscopy , Organosilicon , thin-film deposition
Journal title :
Applied Surface Science
Serial Year :
1999
Journal title :
Applied Surface Science
Record number :
995080
Link To Document :
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