Title of article
Chemical interactions in noncontact AFM on semiconductor surfaces: Si 111/, Si 100/ and GaAs 110/
Author/Authors
Rube´n Pe´rez، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
7
From page
320
To page
326
Abstract
Total-energy pseudopotential calculations are used to study the imaging process in noncontact atomic force microscopy
AFM.on Si 111., Si 100.and GaAs 110.surfaces. The chemical bonding interaction between a localised dangling bond on
the atom at the apex of the tip and the dangling bonds on the adatoms in the surface is shown to dominate the forces and the
force gradients and, hence, to provide atomic resolution. The lateral resolution capabilities are tested in both the Si 100.and
the GaAs 110.surfaces. In the first case, the two atoms in a dimer can be resolved due to the dimer flip induced by the
interaction with the tip during the scan, while in the GaAs 110., we identify the anion sublattice as the one observed in the
experimental images. q1999 Elsevier Science B.V. All rights reserved.
Keywords
GaAs 110. , Atomic force microscopy AFM. , Noncontact , Total-energy pseudopotential calculations , Atomic resolution , Si 100. , Si 111. , Force gradients
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995192
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