Title of article :
Imitation of non-contact mode while scanning in the presence of an electric double layer?
Author/Authors :
I.Yu. Sokolov، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
6
From page :
422
To page :
427
Abstract :
Non-contact atomic force microscopy NCAFM.minimizes the physical interaction between the AFM tip and the surface of interest. Several recent studies have reported observation of single atom defects using this technique. The repulsive force is presumably the primary interatomic force cf. our paper on pseudo-non-contact mode in this issue.responsible for the reported atomic resolution in these studies. The combination of these factors, minimal tip–sample deformation and repulsive force interaction, are responsible for the observation of the single atom defects. In the present study, we show that similar resolution can be achieved utilizing the same two factors but which employs scanning in a surfactant. The method decreases the tip–sample interaction by eliminating the attractive forces between the tip and sample. The surfactant solution induces an electrical double-layer EDL.on the surface of the tip and sample. This EDL creates additional repulsion that is distributed over a large area, and hence does not contribute noticeably to the image contrast during scanning. However, it does compensate for the high pressures normally experienced by the tip in the absence of surfactant. In addition, the presence of the EDL enhances tip stability during the image scan. This method has been tested on surfaces of such minerals as mica, chlorite, and anhydrite. q1999 Elsevier Science B.V. All rights reserved.
Keywords :
True atomic resolution , atomic force microscopy , Molecular force interaction
Journal title :
Applied Surface Science
Serial Year :
1999
Journal title :
Applied Surface Science
Record number :
995210
Link To Document :
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