Pulsed laser deposition of 001/textured LiNbO films on 3 Al O rSiO rSi substrate

On SiO2rSi substrate Si wafer with thermally oxidized SiO2coating., only polycrystalline LiNbO3 thin films were normally obtained. In this work, we found that an ultrathin layer of predeposited Al2O3 layer on SiO2rSi has greatly mediated the growth pattern of the subsequently deposited LiNbO3 films. As a result, highly or completely 001.textured LiNbO3 films were achieved depending on the substrate temperature and the thickness of Al2O3 as well. The textured growth phenomenon is discussed in terms of surface energy relation. q1999 Elsevier Science B.V. All rights reserved.