Enhancement of C-49 to C-54 TiSi phase transformation on 2 001/Si with an ultrathin TiN seed layer

An ultrathin TiN seed layer was used to reduce the transformation temperature of C-49 to C-54 TiSi2. The fine-grained structure of C-49 TiSi2 was induced by the interposing TiN layer. Since C-54 TiSi2 nucleated more easily at the grain boundaries of fine-grained C-49 structure, the phase transformation temperature was reduced. q1999 Elsevier Science B.V. All rights reserved.