Title of article
Quantitative secondary ion mass spectrometry analysis of impurities in GaN and Al Ga N films using molecular ions x 1yx MCsq and MCsq2
Author/Authors
C. Hongo، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
4
From page
306
To page
309
Abstract
In SIMS analysis of GaN and Al Ga N films, MCsqand MCsqion detection M is the element to be analyzed.was x 1yx 2
investigated under Csq bombardment. The MCsq2 ions have a larger ion yield than the MCsq ions when M is one of
electronegative ions. Application of these molecular ions to SIMS analysis has made it possible to detect electropositive and
electronegative elements in a single analysis run. Further, these molecular ions are useful to minimize the matrix effect in
Al Ga N films, with x ranging from 0 to 0.17. The formation mechanism of the MCsq and MCsq ions can also be x 1yx 2
postulated by comparing the useful yield of these molecular ions and that of single negative andror positive.ions. These
molecular ions are assumed to be produced mainly by recombination processes in which sputtered neutral species M andror
MCs. combine with Csq ions. q1999 Elsevier Science B.V. All rights reserved
Keywords
Useful yield , Matrix effect , Gallium nitride , Sputtering , aluminum , Secondary ion mass spectroscopy
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995480
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