Title of article :
Production of large metallic clusters by thermal evaporation
Author/Authors :
O. Buiu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
4
From page :
668
To page :
671
Abstract :
Cluster beam evaporation has been used to produce metallic and semiconductor thin films for microelectronic applications. Previous work showed that the deposition of large clusters of antimony )Sb2000.onto silicon substrates and carbon films can be performed by thermal evaporation through a nozzle orifice and has been modelled using molecular diffusion theory. The results here show that the model can be extended to include other metals e.g., Ag.. TEM shows that cluster sizes in the case of Ag are much smaller than for Sb, having a di-similar statistical spread. Photoluminescence of Mg, Sb and Ag films show decreasing PL intensity with temperature which correlates with the expected concentration of clusters. q1999 Elsevier Science B.V. All rights reserved
Keywords :
production , Large metallic clusters , Thermal evaporation
Journal title :
Applied Surface Science
Serial Year :
1999
Journal title :
Applied Surface Science
Record number :
995552
Link To Document :
بازگشت