Title of article
Hydrogen adsorption site on the Ni 1115- 2=2/–H: a TOF-LERS study
Author/Authors
T. Ito )، نويسنده , , K. Umezawa، نويسنده , , S. Nakanishi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
7
From page
146
To page
152
Abstract
The adsorption site of hydrogen on the Ni 1114- 2=2.–H surface resulting from the H2 exposure at low temperature
was investigated by time-of-flight low energy recoil spectrometry TOF-LERS.. Recoiling spectra induced by pulsed 1 keV
Neq primary-ion beams were monitored as a function of polar and azimuth angles. From classical trajectory calculations and
shadowing and blocking analyses, it was found that the H atoms occupy both the fcc- and hcp-adsorption sites on the
Ni 111. terraces at a height of approximately 1.1–1.5 A° above the plane of the first layer of Ni atoms. Furthermore,
adsorption and desorption measurements show that the initial sticking coefficient of a H atom is s u.f0.45 and the
activation energy of H atoms adsorbed on the surface is evaluated to be 0.42 eV. The onset temperature for desorption was
found to be around 250 K. q1999 Elsevier Science B.V. All rights reserved.
Keywords
surface structure , Impact-collision ion scattering spectroscopy ICSS. , nickel , hydrogen
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995651
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