Title of article
Titanium oxide reduction in ion depth profiling
Author/Authors
L.I. Vergara، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
10
From page
129
To page
138
Abstract
Through Factor Analysis and Auger Electron Spectroscopy AES., we have studied the alterations introduced in the
analysis of chemically complex samples TiO2.by the normal procedure of ion bombardment depth profiling. We studied
the effect of the energy, current density and mass of the impinging particles on the oxide film composition. We found that
the procedure generates in the sample lower oxide states TiO., and that while this effect is independent of the energy and
ion density, it presents a clear dependence on the mass of the impinging ion. Through the comparison of different depth
profiles obtained by sputtering with a couple of different ions, we obtain a better characterization of the oxide films. q1999
Elsevier Science B.V. All rights reserved
Keywords
TiO2 , FA , Sputtering , reduction , AES , depth profiling
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995799
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