Title of article :
Pulsed laser deposition of a-CN :H films: the role of x target-to-substrate distance and laser fluence
Author/Authors :
P. Gonza´lez، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Pages :
4
From page :
454
To page :
457
Abstract :
The effect of the mean free path of the ablated species to the target-to-substrate distance ratio on chemical composition and growth rate of carbon nitride films is reported. The composition of the films deposited at room temperature by ablating a glassy carbon target with an ArF excimer laser 193 nm.in 0.3 Torr ammonia was determined by Fourier transform infrared spectroscopy. At fixed pulse energy, the nitrogen content of the films decreases while the hydrogen content remains practically constant with increasing target-to-substrate distance. When the deposition geometry is fixed, increasing pulse energy results in an increase in the nitrogen content. q2000 Elsevier Science B.V. All rights reserved
Keywords :
thin films , Carbon nitride , Laser ablation
Journal title :
Applied Surface Science
Serial Year :
2000
Journal title :
Applied Surface Science
Record number :
995957
Link To Document :
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