Title of article :
Amplification in light-induced reaction of Cu with Cl in the 2
VUV
Author/Authors :
H. Raaf )، نويسنده , , Sandra M. Groen-Mulder، نويسنده , , G. Kaindl and N. Schwentner، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Abstract :
A non-selective light-induced reaction was observed in the spectral range from 135 to 120 nm due to electronic excitation
of Cl in the gas phase to the 1Sq and 212 u Squ states. It reaches a quantum efficiency of reacted Cu per impinging photon of
174 and the underlying amplification process has an efficiency of 4=106. A selective reaction dominates between 135 and
200 nm with two prominent bands at 170 and 144 nm. It originates from a bulk-excitation with a quantum efficiency of two
reacted atoms per photon. q2000 Elsevier Science B.V. All rights reserved.
Keywords :
Dry etching , Photolithography , Microstructuring , synchrotron radiation , Cl2 , Cu
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science