Abstract :
The structure and chemical composition of electrochemically deposited cobalt, copper and cobaltqcopper on zirconia
have been investigated by X-ray photoelectron spectroscopy XPS., scanning electron microscopy SEM.and scanning
Auger microscopy SAM.methods. It has been established that as-deposited metal crystallites are mainly formed on the
macroconcavities of an electrochemically roughened SS 1.4301 substrate. In the facet zones, the crystallites are much
smaller and have a good dispersion. In this case, the cobalt on the surface is present as Co2q, while copper is found as Cuq.
The deposited metal crystallites show no substantial changes in structure after thermal oxidation, which leads to the
formation of considerably thicker oxide layers on the metal crystallites where cobalt and copper are in the Co3q nd Cu2q
states. The cobalt and copper oxides obtained on ZrO2 are characterized by good adhesion and cause no change in the
specific surface area of porous zirconia films. Modification of the structure, composition and dispersion of the oxide systems
under consideration is promising, with a view to their application as thin porous inorganic catalytic films. q2000 Elsevier
Science B.V. All rights reserved.
Keywords :
Electrochemical deposition , Cobalt , copper , Zirconia films , XPS , SEM