Low-temperature 2008C/growth of diamond on nano-seeded substrates

Fabrication of diamond including diamond-like carbon: DLC.films as electronic materials requires several conditions. They are: 1. low-temperature fabrication or deposition on several substrates. below 3008C, 2. wide-area film deposition onto wide substrates of several square inches, like Si wafer, 3. reproducible deposition of well-defined film quality, and 4. others. In these respects, we have initiated, in the author’s laboratories at Osaka University and Kochi University of Technology, a quite new approach to satisfy the above requirements by using microwave plasma CVD under a magnetic field to be called as ‘‘magneto-active plasma CVD.’’ The films thus fabricated, combined with our special nano-seeding method, have been used as electron emitter with high efficiency for a 3-year Japanese national project ‘‘Development of Ultra Thin Flat Panel Display’’ that started in 1997 with the author being appointed as the project leader. q2000 Published by Elsevier Science B.V.