Title of article :
Sb-terminated Si 110/, Si 100/ and Si 111/ surfaces studied with
high resolution core-level spectroscopy
Author/Authors :
A. Cricenti، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Abstract :
We report on synchrotron radiation photoelectron spectroscopy studies of the Si 2p core levels obtained with very high
resolution from Sb overlayers onto the low-index silicon surfaces Si 110., Si 100. and Si 111.. The improved energy
resolution of the third generation synchrotron radiation facilities has shown the presence of a strong interfacial component
shifted 0.24, 0.2 and 0.13 eV, respectively, on the high binding energy side respect to the bulk peak. Such Si–Sb interface
contribution is ascribed to charge transfer between the metal and the topmost silicon atoms and to the latest layers of silicon
atoms distorted by the reconstruction from the ideal bulk position. A small component is always present on the high kinetic
energy side and is presumably due to contribution from defects. q2000 Elsevier Science B.V. All rights reserved.
Keywords :
Silicon , Synchrotron photoelectron spectroscopy , Semiconducting surfaces
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science