Title of article :
Sb-terminated Si 110/, Si 100/ and Si 111/ surfaces studied with high resolution core-level spectroscopy
Author/Authors :
A. Cricenti، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Pages :
4
From page :
380
To page :
383
Abstract :
We report on synchrotron radiation photoelectron spectroscopy studies of the Si 2p core levels obtained with very high resolution from Sb overlayers onto the low-index silicon surfaces Si 110., Si 100. and Si 111.. The improved energy resolution of the third generation synchrotron radiation facilities has shown the presence of a strong interfacial component shifted 0.24, 0.2 and 0.13 eV, respectively, on the high binding energy side respect to the bulk peak. Such Si–Sb interface contribution is ascribed to charge transfer between the metal and the topmost silicon atoms and to the latest layers of silicon atoms distorted by the reconstruction from the ideal bulk position. A small component is always present on the high kinetic energy side and is presumably due to contribution from defects. q2000 Elsevier Science B.V. All rights reserved.
Keywords :
Silicon , Synchrotron photoelectron spectroscopy , Semiconducting surfaces
Journal title :
Applied Surface Science
Serial Year :
2000
Journal title :
Applied Surface Science
Record number :
996349
Link To Document :
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