Title of article :
Tracing the valence band maximum during epitaxial growth of HfS on WSe 2 2
Author/Authors :
Uwe C. Kreis، نويسنده , , M. Traving، نويسنده , , R. Adelung، نويسنده , , L. Kipp، نويسنده , , M. Skibowski، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Pages :
6
From page :
17
To page :
22
Abstract :
Applying angle resolved photoemission and scanning tunneling microscopy STM.during different stages of epitaxial growth of HfS2 on WSe2 allows an evaluation of the electronic valence band spectra as a function of position z perpendicular to the interface. In combination with photon energy dependent photoemission measurements of clean WSe2 and HfS2 samples, mapping kH dispersions of valence bands’ reliable values for the valence band maxima VBM.have been obtained. Upon different stages of growth, the valence band maximum can thus be traced during the build up of the interface giving an accurate value for the valence band offset of this heterojunction. q2000 Elsevier Science B.V. All rights reserved.
Keywords :
van der Waals epitaxy , Semiconductor heterojunction , layered materials , Valence band offset , Photoemission spectroscopy
Journal title :
Applied Surface Science
Serial Year :
2000
Journal title :
Applied Surface Science
Record number :
996474
Link To Document :
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