High-intensity sources of incoherent UV and VUV excimer radiation for low-temperature materials processing

The principles and properties of ultraviolet (UV) and vacuum ultraviolet (VUV) radiation generated by decaying excimer complexes are discussed. Excimer lamps offer high-intensity narrow-band radiation at various UVand VUV wavelengths and reach high ef®ciencies. They can provide high photon ¯uxes over extended areas. The use of excimers offers several advantages: excimers can be extremely ef®cient energy converters transforming electron kinetic energy into UV radiation. No self-absorption is observed in excimer systems. In most cases, excimer forming gas mixtures exhibit one dominant narrow emission band. Excimer systems can be pumped at extremely high power densities before saturation effects start to limit the spontaneous emission. Thus, extremely bright UV and VUV sources can be built. Different types of excimer lamps can be fabricated utilising, repetitively pulsed high power discharges, microwave discharges and dielectric-barrier discharges (silent discharges). For large-scale industrial applications dielectric-barrier discharges using fairly simple discharge con®gurations currently represent the most mature excimer lamp technology. Recent applications of excimer lamps include photo-deposition of large area or patterned thin metal ®lms, of high- and low-dielectric constant insulating layers, photo-assisted lowtemperature oxidation of Si, SiGe and Ge, UV curing, polymer etching and microstructuring of polymer surfaces. Applications investigated so far clearly demonstrate that low cost, high power excimer lamp systems can provide an interesting alternative to excimer lasers for industrial large-scale low-temperature materials processing. # 2000 Elsevier Science B.V. All rights reserved.