• Title of article

    STM study of structural changes on Si(100)2 1-Sb surface induced by atomic hydrogen

  • Author/Authors

    O. Kubo*، نويسنده , , J.-T. Ryu، نويسنده , , H. TANI، نويسنده , , T. Harada، نويسنده , , T. Kobayashi، نويسنده , , M. Katayama، نويسنده , , K. Oura، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    7
  • From page
    93
  • To page
    99
  • Abstract
    Using scanning tunneling microscopy (STM) and low energy electron diffraction (LEED), we have studied the structural changes of the Si(100)2 1-Sb surface caused by hydrogen adsorption at both room temperature (RT) and 3008C. We have found that the ordering of a 2 1-Sb surface is more stable against atomic hydrogen exposure at 3008C than at RT, and that some Sb atoms desorb during atomic hydrogen exposure at 3008C. However, upon hydrogen exposure at both temperatures, we have observed neither three-dimensional islands nor the hydrogen terminated Si substrate which were reported for hydrogen interaction with the other metal/Si systems. On the 2 1-Sb surface exposed to atomic hydrogen of 1000 L at RT followed by 5508C annealing, long bright lines similar to those reported for the Bi/Si(100) system have also been found. # 2001 Elsevier Science B.V. All rights reserved
  • Keywords
    Silicon , hydrogen , Antimony , Scanning tunneling microscopy (STM) , Incorporation , Line structure , desorption
  • Journal title
    Applied Surface Science
  • Serial Year
    2001
  • Journal title
    Applied Surface Science
  • Record number

    996690