Title of article
Ion beam induced reaction of carbon ®lms on Si(1 0 0)
Author/Authors
Shunichi Hishita، نويسنده , , Takashi Aizawa، نويسنده , , Shigeru Suehara، نويسنده , , Hajime Haneda، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
4
From page
296
To page
299
Abstract
The irradiation effects of 2 MeV He and Ar ions on the ®lm structure of the C±Si system were investigated with RHEED
and XPS. The formation of SiC phase and/or the growth of epitaxial SiC were possible by He irradiation for the carbon ®lms
up to 0.7 nm in thickness, which was thinner than that by Ar irradiation. The He irradiation could not grow the turbostratic
graphite which could be grown by Ar irradiation. The mechanism of the formation and the epitaxial growth of SiC by ion
irradiation was discussed from the view point of the energy transfer from the irradiated ions. # 2001 Elsevier Science B.V.
All rights reserved.
Keywords
Ion beam induced chemical reaction , Ion beam induced epitaxial growth , Carbon thin ®lm , silicon carbide , Turbostratic graphite
Journal title
Applied Surface Science
Serial Year
2001
Journal title
Applied Surface Science
Record number
996731
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