Title of article :
Formation of binary clusters by molecular ion irradiation
Author/Authors :
Hiroyuki Yamamoto، نويسنده , , Hidehito Asaoka، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
5
From page :
305
To page :
309
Abstract :
In the present study, we have observed silicon±carbon cluster ions (SinCm‡) emitted from a Si(1 0 0) surface under irradiation of reactive molecular ions, such as C6F5‡, at 4 keV, 1 mA/cm2. The cluster Sin up to n ˆ 8 and ``binaryʹʹ cluster SinC up to n ˆ 6 are clearly detected for the C6F5‡ irradiation. Stoichiometric clusters (SinCm n ˆ m) except SiC‡ and other binary clusters which contain more than two carbon atoms (m 2) were scarcely observed. The observed clusters show a yield alternation between odd and even n. The intensities of Si4, Si6 and Si5C clusters are relatively higher than those of the neighboring clusters. In the case of Si5C, it is considered that doped carbon atom acts as silicon atom. These results imply that the recombination through the nascent cluster emission and subsequent decomposition takes place during the cluster formation. # 2001 Elsevier Science B.V. All rights reserved.
Keywords :
secondary ion mass spectroscopy , Ion±solid interactions , Silicon , silicon carbide , Clusters , Semiconducting surfaces
Journal title :
Applied Surface Science
Serial Year :
2001
Journal title :
Applied Surface Science
Record number :
996733
Link To Document :
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